As shown in Figure 4- (a), when the scratch depth is the same, as the abrasive particle size increases, the normal force received during the scratch process on the GaAs surface is continuously increasing and is linear increase.
As shown in Fig. 4-(a), with the same scratch depth, the force of the force is increasing and increasing linearly during the scratch on the GaAs surface as the particle size increases.
As shown in Fig. 4 - (a), under the same scratch depth, with the increase of abrasive particle size, the normal force on the GaAs surface during the scratch process increases continuously and linearly.<br>