1.磁流变抛光过程中，磨粒粒径，法向载荷和GaAs的各向异性都会影响到

1. During the magnetorheological polishing process, the abrasive particle size, normal load and GaAs anisotropy all affect the formation of surface scratches. In order to reduce the formation of scratches, a larger abrasive particle size should be selected, 10 nm in the simulation, and 100 nm in the magnetorheological polishing fluid. <br>Choose a smaller normal load, but also pay attention to meet the needs of processing efficiency.

1. In the process of magnetic rheo-polishing, the grinding particle size, the mesotropic load and the anisotropy of GaAs will affect the formation of surface scratches. In order to reduce the formation of scratches, a larger grinding particle size should be selected, 10nm should be selected in the simulation, and 100nm in magnetic rheumating polishing fluid.<br>Choose a smaller method load, but also pay attention to meet the needs of processing efficiency.

1. In the process of MRF polishing, abrasive particle size, normal load and anisotropy of GaAs all affect the formation of scratch. In order to reduce the formation of scratches, we should choose a larger particle size, 10 nm in the simulation and 100 nm in the MRF polishing fluid.<br>Select a smaller normal load, but also pay attention to meet the requirements of machining efficiency.<br>