In the fume cupboard, a small slice

In the fume cupboard, a small sliced silicon chip was placed in a clean hydroxylated beaker (dessicated), head up, and rinsed 3 times with deionized water. The water was poured out andimmediately 5 mL of hydrogen peroxide (H2O2) was added to the beaker with a pipette (hydrogen peroxide dedicated). Then 15 mL of concentrated sulfuric acid was added and the reaction was kept by slowly vibrating for 30 minutes, which forms the surface hydroxylation. After removing the previous liquid and washing the Si three times with deionized water, a large amount of water was used to preserve the silicon substrate.