The electrochemical deposition meth

The electrochemical deposition method uses a specific precursor solution as the electrolyte, which reacts under the action of a certain current, and then grows a carbon nitride film on the substrate. In 1999, Cao et al. Electrodeposited carbon nitride film with acetonitrile as electrolyte at 50 ℃ and 1.00kv for 8 hours, and then obtained carbon nitride film with N / C of about 0.25. Then, we use dicyandiamide acetone solution as electrolyte, and obtain carbon nitride film with N / C of 0.48 at the voltage of 1.00-1.50v. It is concluded that electrolyte and substrate have obvious influence on the structure and properties of carbon nitride film. At the same time, the group selected cyanuric chloride and melamine solution as electrolyte, and successfully synthesized C3N4 film on Si substrate at 25 ℃ and 12.00kv high pressure. Compared with other synthesis methods, although the prepared carbon nitride nitrogen is relatively low, it has the following two advantages: ① simple reaction equipment; ② simple process, and easy to scale up and industrialization.