The most significant difference is that the etching gas is directly generated by the evaporation of the hot HF solution, which is heated to 90 degrees Celsius with a heating wire
The most significant difference is the evaporation of the etching gas directly from the hot HF solution, which is heated to 90 degrees Celsius by electric hot wire.
The most significant difference is that the etching gas is generated directly from the evaporation of a hot HF solution heated to 90 ° C by an electric heating wire