in neat triglyme, the separation cu

in neat triglyme, the separation curves closely match the approach characteristics during compression of the polymeric structure formed (Figure S6). This indicates a stable polymeric structure that decompresses upon separation. Interestingly, there is a significant adhesion hysteresis with an adhesive minimum at D ~ 5 nm, which is close to the distance where the polymer repulsion kicks in during approach. This is a strong sign that the polymeric network can effectively bridge the two surfaces. The distance of this minimum is too far out to have anything to do with a van der Waals interaction induced minimum. In contrast, even at low csalt = 0.001 M LiTf concentration, we find no significant indications for a polymeric network growth, and the adhesive minimum is located at D ~ 0