为进一步提高金属钽作为植入材料时与体内细胞的贴壁生长情况,采用微弧氧化技术在金属钽表面原位生成多孔陶瓷层。研究了硅酸钠、磷酸钠、偏铝酸钠三种的英语翻译

为进一步提高金属钽作为植入材料时与体内细胞的贴壁生长情况,采用微弧氧化

为进一步提高金属钽作为植入材料时与体内细胞的贴壁生长情况,采用微弧氧化技术在金属钽表面原位生成多孔陶瓷层。研究了硅酸钠、磷酸钠、偏铝酸钠三种电解液体系对金属钽表面微弧氧化陶瓷层微观形貌、相组成、生长特性等,最后借助电化学阻抗谱特性探讨了不同电解液体系下陶瓷层的生长行为。结果表明金属钽在硅酸钠、磷酸钠、偏铝酸钠电解液中均可形成微弧氧化陶瓷膜层。在硅酸钠和磷酸钠电解液体系中制备的陶瓷层相组成为Ta2O5,在偏铝酸钠电解液中制备的陶瓷层主要有非晶Ta-O氧化物组成。金属钽在偏铝酸钠电解液中形成的致密膜层阻抗值(R2)最大,说明在偏铝酸钠电解液液中形成的陶瓷膜层更加致密,陶瓷层性能较好。
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结果 (英语) 1: [复制]
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To further enhance the tantalum metal as the growth of adherent cells in the body when the implant material, the micro-arc oxidation porous ceramic layer generated in situ on the surface of tantalum metal. Study sodium silicate, sodium phosphate, sodium aluminate three kinds of electrolyte systems tantalum surface morphology of micro-arc oxidation ceramic layer, phase, growth characteristics, and finally discusses the body by means of different electrolytes EIS growth behavior of the ceramic layer. The results show that the tantalum oxide can be formed Microarc film of sodium silicate, sodium phosphate, sodium aluminate electrolyte. Ceramic layer of sodium silicate and sodium phosphate prepared in-phase electrolyte system consisting of Ta2O5, the ceramic layer is produced in the electrolyte sodium aluminate mainly amorphous Ta-O oxide. Maximum dense-film resistance value (R2) formed in the tantalum electrolytic solution sodium aluminate described ceramic coating formed in the electrolytic solution sodium aluminate solution denser, better performance of the ceramic layer.
正在翻译中..
结果 (英语) 2:[复制]
复制成功!
为进一步提高金属钽作为植入材料时与体内细胞的贴壁生长情况,采用微弧氧化技术在金属钽表面原位生成多孔陶瓷层。研究了硅酸钠、磷酸钠、偏铝酸钠三种电解液体系对金属钽表面微弧氧化陶瓷层微观形貌、相组成、生长特性等,最后借助电化学阻抗谱特性探讨了不同电解液体系下陶瓷层的生长行为。结果表明金属钽在硅酸钠、磷酸钠、偏铝酸钠电解液中均可形成微弧氧化陶瓷膜层。在硅酸钠和磷酸钠电解液体系中制备的陶瓷层相组成为Ta2O5,在偏铝酸钠电解液中制备的陶瓷层主要有非晶Ta-O氧化物组成。金属钽在偏铝酸钠电解液中形成的致密膜层阻抗值(R2)最大,说明在偏铝酸钠电解液液中形成的陶瓷膜层更加致密,陶瓷层性能较好。
正在翻译中..
结果 (英语) 3:[复制]
复制成功!
In order to further improve the growth of tantalum on the cell wall, the porous ceramic layer was formed on the surface of tantalum by micro arc oxidation. The micro morphology, phase composition and growth characteristics of micro arc oxidation ceramic layer on Tantalum surface in three electrolyte systems of sodium silicate, sodium phosphate and sodium metaaluminate were studied. Finally, the growth behavior of ceramic layer in different electrolyte systems was discussed by electrochemical impedance spectroscopy. The results show that tantalum can form micro arc oxidation ceramic coating in sodium silicate, sodium phosphate and sodium aluminate electrolyte. Ta2O5 is the phase composition of ceramic layer prepared in sodium silicate and sodium phosphate electrolyte system, and amorphous ta-o oxide is the main component of ceramic layer prepared in sodium aluminate electrolyte system. The impedance value (R2) of the dense film formed by tantalum in the electrolyte of sodium aluminate is the largest, which indicates that the ceramic film formed in the electrolyte of sodium aluminate is more compact and the performance of the ceramic layer is better.
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