The method of KOH smooth processing is the fastest and the reduction of the processed wafer profile Pt value and the weighted average height of the suede structure is the largest, reaching 20% and 30%
THE METHOD OF KOH SLEEK TREATMENT IS THE MOST EFFICIENT AND THE WEIGHTED AVERAGE HEIGHT OF THE TREATED SILICON PROFILE PT VALUE AND THE SUEDE STRUCTURE ARE THE LARGEST, REACHING 20% AND 30%
The efficiency of KOH is the fastest, and the reduction of Pt value and weighted average height of suede structure is the largest, reaching 20% and 30%