GaAs由于原子面密度和层间距不同，导致划擦过程中相接触原子数也不同。

GaAs由于原子面密度和层间距不同，导致划擦过程中相接触原子数也不同。因此，不能用法向力和摩擦力来同时准确描述划擦过程中磨粒和工件之间的受力情况。通常用摩擦系数来进行评价。定义划擦过程中平均摩擦系数为切向力与法向力的比值。将划擦过程中GaAs晶体表面的平均摩擦系数如图所示，随着磨粒粒径的增大，在划擦过程中的正向力是增大的，并且增加趋势是等量的。但平均摩擦系数在粒径为5nm时，摩擦系数接近0.45，并随着磨粒直径的增大，摩擦系数是不断变小的，并且下降趋势变小。平均摩擦系数的变化可以描述为一条光滑曲线。

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结果 (英语) 1: [复制]

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GaAs have different atomic areal density and interlayer spacing, resulting in different numbers of atoms in contact during the scratching process. Therefore, the normal force and friction force cannot be used to accurately describe the force between the abrasive particles and the workpiece during the scratching process. The coefficient of friction is usually used for evaluation. The average friction coefficient during the scratching process is defined as the ratio of tangential force to normal force. The average friction coefficient of the GaAs crystal surface during the scratching process is shown in the figure. As the particle size of the abrasive particles increases, the forward force during the scratching process increases, and the increase trend is equal. However, when the average friction coefficient is 5nm, the friction coefficient is close to 0.45, and with the increase of the abrasive particle diameter, the friction coefficient is continuously decreasing, and the downward trend is becoming smaller. The change of the average friction coefficient can be described as a smooth curve.

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结果 (英语) 2:[复制]

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GaAs have different numbers of contact atoms during the stroke process due to the different density and layer spacing of the atomic surface. Therefore, it is not possible to use forward force and friction to accurately describe the force condition between the grinding grain and the workpiece during the stroke process. The coefficient of friction is usually evaluated. The average coefficient of friction during the stroke is defined as the ratio of the tangent force to the force of the order. The average coefficient of friction on the surface of GaAs crystals during the stroke process is shown as shown in the figure, with the increase of the particle size of the grinding grain, the positive force in the stroke process is increased, and the increasing trend is equal. However, the average coefficient of friction is close to 0.45 at the particle size of 5nm, and with the increase of the grinding particle diameter, the coefficient of friction is constantly smaller and the downward trend is smaller. Changes in the average coefficient of friction can be described as a smooth curve.

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结果 (英语) 3:[复制]

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Due to the different surface density and layer spacing of GaAs, the number of atoms in contact with each other is also different. Therefore, the direction force and friction force can not be used to accurately describe the force between the abrasive particles and the workpiece in the process of scratching at the same time. Friction coefficient is usually used for evaluation. The average friction coefficient is defined as the ratio of tangential force to normal force. The average friction coefficient of GaAs crystal surface during scratching is as shown in the figure. With the increase of particle size, the positive force increases during scratching, and the increasing trend is equal. However, when the average friction coefficient is 5nm, the friction coefficient is close to 0.45, and with the increase of the diameter of the abrasive particles, the friction coefficient is constantly smaller, and the downward trend is smaller. The change of average friction coefficient can be described as a smooth curve.

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