正如我们所知，光学性能和电学性能是衡量太阳能池质量的重要指标，黑硅有着

As we know, the optical and electrical properties of the solar cell is an important indicator of quality, black silicon has a very excellent light trapping performance, but its electrical properties is unsatisfactory, because the surface of the fine black silicon nanostructures such that the carrier is composite easily, causing a lot loss in efficiency, and even the efficiency of black silicon solar cell is lower than ordinary batteries, so it is particularly important in the black passivation of silicon solar cells, the surface of green light through the use of dielectric passivation material carriers composite greatly reduced, conventional passivation method is atomic deposition,

As we all know, optical performance and electrical performance are important indicators of the quality of solar pools, black silicon has a very excellent trapping performance, but its electrical performance is not satisfactory, because the tiny nanostructure of the black silicon surface makes the carriere easy to compound, resulting in a large amount of efficiency loss, Even make the efficiency of black silicon solar cell than ordinary battery is lower, so the bluntization of black silicon solar battery is particularly important, through the use of dielectric passivation material can make the surface photozor compound greatly reduced, the commonly used passivation method is atomic deposition method,

As we all know, optical and electrical properties are important indicators to measure the quality of solar cell. Black silicon has excellent light trapping performance, but its electrical performance is unsatisfactory. Because of the small nanostructure on the surface of black silicon, carriers are easy to compound, resulting in a large amount of efficiency loss, and even the efficiency of black silicon solar cell is lower than that of ordinary cells, so in black silicon solar cell Passivation of silicon solar cells is particularly important. The surface photo generated carrier recombination can be greatly reduced by using dielectric passivation materials. The commonly used passivation method is atomic deposition,<BR>