3.5颗粒团聚对GaAs划痕形成的影响抛光过程中，磨粒在抛光介质中会发

3.5颗粒团聚对GaAs划痕形成的影响抛光过程中，磨粒在抛光介质中会发生团聚现象，这是由于颗粒间的吸附和排斥的共同作用造成的。为了研究磨粒间的团聚现象会对划痕的形成造成多大的影响，本文采用两个磨粒粒径为5.0nm的磨粒模型替代抛光液中的团聚现象。建立的模型如图所示。并进行划擦仿真分析，得到仿真结果如图所示。并将仿真结果与单个磨粒粒径为5.0nm和10.0nm的划擦结果进行对比。

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结果 (英语) 1: [复制]

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3.5 Effect of particle agglomeration on the formation of GaAs scratches During the <br>polishing process, abrasive particles will agglomerate in the polishing medium, which is caused by the combined action of adsorption and repulsion between particles. In order to study how much the agglomeration phenomenon between the abrasive particles will affect the formation of scratches, this paper uses two abrasive particle models with a particle size of 5.0 nm to replace the agglomeration phenomenon in the polishing liquid. The established model is shown in the figure. And carry on the scratch simulation analysis, get the simulation result as shown in the figure. The simulation results are compared with the scratch results of the single abrasive grains with a particle size of 5.0 nm and 10.0 nm.

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结果 (英语) 2:[复制]

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3.5 Effect of particle reuniting on GaAs scratch formation<br>During the polishing process, the grinding particles will be reunited in the polishing medium, which is caused by the combination of adsorption and rejection between the particles. In order to study how much the phenomenon of reunion between grinding particles will affect the formation of scratches, two abrasive grain-diameter models with a mill size of 5.0nm are used to replace the phenomenon of reunion in polishing fluid. The model is modeled as shown. And scratch simulation analysis, to obtain the simulation results as shown. The simulation results were compared with the scratching results with a single abrasive particle size of 5.0nm and 10.0nm.

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结果 (英语) 3:[复制]

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3.5 effect of particle agglomeration on GaAs scratch formation<br>In the process of polishing, the agglomeration of abrasive particles occurs in the polishing medium, which is caused by the interaction of adsorption and repulsion between particles. In order to study the effect of agglomeration between abrasive particles on the formation of scratches, two models of abrasive particles with a diameter of 5.0nm were used instead of agglomeration in polishing solution. The established model is shown in the figure. The simulation results are as shown in the figure. The simulation results are compared with the scratch results of single abrasive particles with diameters of 5.0nm and 10.0nm.<br>

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