Based on a similar concept, the chemical composition of the surface layer of the substrate is changed by ion implantation, so that the surface of the material is rich in silicon and aluminum plasma.
Based on similar concepts, the chemical composition of the surface of the substation is changed by ion injection, so that the surface of the material is rich in silicon and aluminum plasma.
Based on the similar concept, the chemical composition of the surface layer of the substrate is changed by ion implantation, which makes the surface of the material contain rich silicon and aluminum plasma.<br>