在本文中，将精氨酸和Triton X-100作为主要的络合剂和表面活性

Herein, arginine, and Triton X-100 was added to the washing liquid based on FA / O II in order to remove the effect of the change in concentration of BTA studies (three chemical substances as the primary surfactant and complexing agent molecular structure shown in Figure 1). Although FA / O II is a polyhydroxy polyamines organic molecules, but the FA / O II having 13 or more chelate rings, no metal ions, and can form a stable chelate with copper ions, but because of the high vapor pressure, it does not evaporate to the environment, leading to the deterioration of a photolithography process [17]. Arginine is a basic amino acid, containing amino and carboxyl functional groups may be combined to promote the complex copper ions to prevent the redeposition of [23-24]. Triton X-100 is a nonionic surfactant having a low surface tension and good wettability, during the cleaning process do not introduce ionic contaminants [25-26]. Angle measurement and electrochemical method characterized by removing the contact BTA, and analyzed after cleaning the copper surface roughness by atomic force microscopy (AFM).

In this paper, arginine and Triton X-100 are added as the primary complexagent and surfactant to the FA/O II-based cleaning fluid to study the effect of concentration changes on the removal of BTA (the molecular structure of the three chemicals is shown in Figure 1). Although FA/O II is a multihydroxy-clustered organic macromolecule, FA/O II has more than 13 chelate rings, no metal ions, and can form a stable chelation with copper ions, but due to high vapor pressure, it does not evaporate into the environment, resulting in a deterioration of the photolithography process. Arginine is an alkaline amino acid that contains amino and argon-based meta-energy groups that promote the integration of copper ions and prevent re-deposition. Triton X-100 is a non-ionic surfactant with low surface tension and good wetting, and does not introduce ion contamination during cleaning. The removal of BTA was characterized by contact angle measurement and electrochemical methods, and the roughness of the finished copper surface was analyzed by atomic force microscopy (AFM).

In this paper, arginine and Triton X-100 are added to the cleaning solution based on FA / O II as the main complexing agent and surfactant to study the removal effect of BTA by concentration change (the molecular structure of the three chemicals is shown in Figure 1). Although fa / O II is a kind of polyhydroxy polyamine organic macromolecule, FA / O II has more than 13 chelating rings, no metal ions, and can form stable chelates with copper ions. However, due to high vapor pressure, it will not evaporate into the environment, resulting in the deterioration of lithography process [17]. Arginine is an alkaline amino acid, containing amino and carboxyl functional groups, which can promote the complexation of copper ions and prevent redeposition [23-24] Triton X-100 is a non-ionic surfactant with low surface tension and good wettability, which will not introduce ion pollution in the cleaning process [25-26]. The removal of BTA was characterized by contact angle measurement and electrochemical method, and the surface roughness of cleaned copper was analyzed by AFM.<br>