1.我司固态电容制程全工序，针对机台卫生清理频次由之前4小时一次，调整

1.我司固态电容制程全工序，针对机台卫生清理频次由之前4小时一次，调整至2小时一次，确保机台干净，避免电容表面脏污发生。<br>2.新增外观脏污不良二次清洗作业标准，在《清洗作业指导书》中明确规定“外观脏污清洗重工时，从清洗机第三段开始”，不在二次浸泡清洗剂（NaOH），避免电容铝壳表面起泡不良。

1.我司固态电容制程全工序，针对机台卫生清理频次由之前4小时一次，调整至2小时一次，确保机台干净，避免电容表面脏污发生。<br>2.新增外观脏污不良二次清洗作业标准，在《清洗作业指导书》中明确规定“外观脏污清洗重工时，从清洗机第三段开始”，不在二次浸泡清洗剂（NaOH），避免电容铝壳表面起泡不良。

1. For the whole process of solid-state capacitor process of our company, the cleaning frequency of the machine is adjusted from once every 4 hours to once every 2 hours to ensure that the machine is clean and avoid the occurrence of dirt on the capacitor surface.<br>2. New secondary cleaning operation standard for poor appearance dirt is added. In the cleaning operation instruction, it is clearly specified that "when heavy cleaning of appearance dirt starts from the third section of the cleaning machine", cleaning agent (NaOH) shall not be soaked for the second time to avoid poor foaming on the surface of capacitor aluminum shell.<br>