As a typical semiconductor, TiO2 has two energy bands sepa- rated by a的简体中文翻译

As a typical semiconductor, TiO2 ha

As a typical semiconductor, TiO2 has two energy bands sepa- rated by an energy level (i.e. band gap) (Fig. 1a), thus valence band (VB, which has lower energy level and is fully occupied at 0 K) and conduction band (CB, which has higher energy level and is empty at 0 K). The energy level of the highest filled orbital at 0 K is de- fined as the Fermi level (Ef), which lies in between the valence band and the conduction band, as shown in Fig. 1a (Weller, 2014). When TiO2 is in contact with a reaction solution, a Schottky junc- tion is formed at the interface. Due to the difference between the Ef of TiO2 and the redox potential of the solution (Eredox), the Ef of TiO2 would change to reach an equilibrium with the Eredox of the reaction solution, resulting in the formation of band bending within TiO2, and the amount of band bending depends on the difference between the Ef and the Eredox (Bessegato et al., 2015; Paramasivam et al., 2012; Zhang and Yates, 2012). The region where the band bending takes place is defined as space charge layer (SCL) (Bessegato et al., 2015). More detailed review works on the electrochemical properties of semiconductors can be seen in the literature (Paramasivam et al., 2012; Zhang and Yates, 2012).
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作为典型的半导体,TiO2具有两个能带,分别由能级(即带隙)隔开(图1a),因此价带(VB具有较低的能级,并在0 K时被完全占据)和导带(CB,它具有较高的能级,在0 K时为空)。如图1a所示,最高填充轨道在0 K处的能级定义为费米能级(Ef),它位于价带和导带之间(Weller,2014)。当TiO2与反应溶液接触时,在界面处会形成肖特基结。由于TiO2的Ef和溶液的氧化还原电位(Eredox)之间存在差异,因此TiO2的Ef会发生变化,从而与反应溶液的Eredox达到平衡,从而导致TiO2内形成能带弯曲,带弯曲的程度取决于Ef和Eredox之间的差异(Bessegato等,2015; Paramasivam等,2012; Zhang和Yates,2012)。带弯曲发生的区域被定义为空间电荷层(SCL)(Bessegato等,2015)。可以在文献中看到有关半导体电化学特性的更详细的综述工作(Paramasivam等,2012; Zhang and Yates,2012)。
正在翻译中..
结果 (简体中文) 2:[复制]
复制成功!
As a typical semiconductor, TiO2 has two energy bands sepa- rated by an energy level (i.e. band gap) (Fig. 1a), thus valence band (VB, which has lower energy level and is fully occupied at 0 K) and conduction band (CB, which has higher energy level and is empty at 0 K). The energy level of the highest filled orbital at 0 K is de- fined as the Fermi level (Ef), which lies in between the valence band and the conduction band, as shown in Fig. 1a (Weller, 2014). When TiO2 is in contact with a reaction solution, a Schottky junc- tion is formed at the interface. Due to the difference between the Ef of TiO2 and the redox potential of the solution (Eredox), the Ef of TiO2 would change to reach an equilibrium with the Eredox of the reaction solution, resulting in the formation of band bending within TiO2, and the amount of band bending depends on the difference between the Ef and the Eredox (Bessegato et al., 2015; Paramasivam et al., 2012; Zhang and Yates, 2012). The region where the band bending takes place is defined as space charge layer (SCL) (Bessegato et al., 2015). More detailed review works on the electrochemical properties of semiconductors can be seen in the literature (Paramasivam et al., 2012; Zhang and Yates, 2012).
正在翻译中..
结果 (简体中文) 3:[复制]
复制成功!
作为一种典型的半导体,TiO2有两个能带,由一个能级(即带隙)(图1a)分开,即价带(VB,其具有较低的能级,在0K下被完全占据)和导带(CB,其具有较高的能级,在0K时为空)。0 K时最高填充轨道的能级定义为费米能级(Ef),位于价带和导带之间,如图1a所示(Weller,2014)。当TiO2与反应溶液接触时,在界面处形成肖特基连接。由于TiO2的Ef和溶液的氧化还原电位(Eredox)之间存在差异,TiO2的Ef将发生变化,以与反应溶液的Eredox达到平衡,从而在TiO2中形成带弯曲,而带弯曲量取决于Ef和Eredox之间的差异(Bessegato等人,2015年;Paramasivam等人,2012年;Zhang和Yates,2012年)。发生带弯曲的区域被定义为空间电荷层(SCL)(Bessegato等人,2015)。有关半导体电化学性质的更详细的综述工作可参见文献(Paramasivam等人,2012;Zhang和Yates,2012)。<br>
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