When placed horizontally, the roughness of the lower surface at the same spatial position after polishing increases from the original 1.130 μm to 1.655 μm, and the dimensional change is also reduced from the original 83 μm by 74.69%
When placed horizontally, the roughness of the lower surface at the same spatial position after polishing is changed from the original 1.130 μ M up to 1.655 μ m. And the size change is also from the original 83 μ M decreased by 74.69%
When placed horizontally, the roughness of the lower surface at the same spatial position after polishing increased from 1.130μm to 1.655μm, and the size change also decreased by 74.69% from 83 μ m.