The gas preferentially gathers and etches on the scratches or protrusions of the silicon wafer, so the cut lines on the surface of the silicon wafer are easily corroded and flattened.
The gas first gathers and etches at the scratch or protrusion of the silicon wafer, so the cutting pattern on the surface of the silicon is easily eroded and flattened.
The gas preferentially accumulates and etches on the scratch or protuberance of silicon wafer, so the cutting lines on the surface of silicon wafer are easy to be corroded and flattened,<BR>