陈春明等人在常规酸中加入一种添加剂，可以降低硅表面激活点的差异性同时降

Chen Chunming et al adding an acid in a conventional additive, can reduce the difference of the silicon surface activation point while reducing the reaction rate, the reaction more controllable, obtained after texturing the reflectance of 24.3%, a conventional mortar cut has reached the Polysilicon reflectance texturing

Chen Chunming et al. added an additive to the conventional acid, which can reduce the difference between the activation points of the silicon surface and reduce the reaction rate, make the reaction more controllable, and get 24.3% reflectivity after the velvet, and also achieve the reflectivity of the traditional mortar cutting polysilicon velvet

Chen Chunming et al. added an additive to conventional acid, which can reduce the difference of activation point on silicon surface and the reaction rate, and make the reaction more controllable. After making cashmere, the reflectivity of 24.3% was obtained, and the reflectivity of cutting polycrystalline silicon cashmere with traditional mortar was also reached.<BR>