镍钒溅射靶材是在制备镍钒合金的过程中， 在镍熔体中加入钒， 使制备出的

镍钒溅射靶材是在制备镍钒合金的过程中， 在镍熔体中加入钒， 使制备出的合金更有利于磁控溅射， 结合了镍溅射靶材和钒溅射靶材的优点， 可一次完成溅射镍层（ 粘结层） 和钒层（ 阻挡层） 。镍钒合金无磁性， 有利于磁控溅射 。在电子及信息产业中， 基本替代了纯镍溅射靶材。

Nickel vanadium sputtering target is to add vanadium to the nickel melt during the preparation of nickel vanadium alloy, so that the prepared alloy is more conducive to magnetron sputtering. It combines the advantages of nickel sputtering target and vanadium sputtering target, It can complete the sputtering of nickel layer (bonding layer) and vanadium layer (barrier layer) at one time. Nickel vanadium alloy is non-magnetic and conducive to magnetron sputtering. It basically replaces the pure nickel sputtering target in the electronics and information industry.

Nickel-vanadium sputtering target is the process of preparing nickel-vanadium alloy, in which vanadium is added into the nickel melt, so that the prepared alloy is more conducive to magnetron sputtering. Combining the advantages of nickel sputtering target and vanadium sputtering target, the nickel layer (bonding layer) and vanadium layer (barrier layer) can be sputtered at one time. Nickel-vanadium alloy is nonmagnetic, which is beneficial to magnetron sputtering. In the electronics and information industry, it has basically replaced pure nickel sputtering targets.