在划痕仿真过程中，需要将压头刚性化，并垂直于砷化镓材料表面压入恒定的深

在划痕仿真过程中，需要将压头刚性化，并垂直于砷化镓材料表面压入恒定的深度，在沿着既定方向进行滑动。划擦之后，在砷化镓表面会形成划痕，通过对仿真划痕模型进行分析，研究划痕过程中所受力情况及划痕损伤的特性和砷化镓材料的变形特性。为了实现上述研究，仿真分析均选择在同一深度下进行仿真分析。

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结果 (英语) 1: [复制]

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In the process of scratch simulation, the indenter needs to be rigidized and pressed into a constant depth perpendicular to the surface of the gallium arsenide material, and then slide along a predetermined direction. After scratching, scratches will be formed on the surface of gallium arsenide. By analyzing the simulated scratch model, the stress conditions during the scratching process and the characteristics of scratch damage and the deformation characteristics of gallium arsenide materials are studied. In order to realize the above-mentioned research, simulation analysis chooses to perform simulation analysis at the same depth.

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结果 (英语) 2:[复制]

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During scratch simulation, the press head needs to be rigidized and pressed perpendicular to the surface of the gallium arsenide material to a constant depth, sliding in the established direction. After scratching, scratches will be formed on the surface of gallium arsenide, and through the analysis of the simulation scratch model, the force and the characteristics of scratch damage and the deformation characteristics of the arsenide material are studied. In order to realize the above research, the simulation analysis is selected to carry on the simulation analysis at the same depth.

正在翻译中..

结果 (英语) 3:[复制]

复制成功！

In the process of scratch simulation, it is necessary to rigidize the indenter and press it into a constant depth perpendicular to the surface of GaAs material to slide along the given direction. After scratch, the scratch will be formed on the surface of GaAs. Through the analysis of the simulation scratch model, the stress, scratch damage characteristics and deformation characteristics of GaAs material in the scratch process are studied. In order to achieve the above research, simulation analysis is carried out at the same depth.<br>

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